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ELECTRON RESISTS PROXIMITY EFFECT CORRECTION ANTI CHARGING ETCHING EVAPORATION/LIFTOFF AFM IMAGING SEM IMAGING CONTACT PROFILOMETRY REFLECTOMETRY ELLIPSOMETRY NANOIMPRINT TEMPLATES

SEM imaging is often necessary for observation and characterization of nanoscale patterns. See the SUMS website for available SEM tools.

Electron Beam Lithography Facility Institute for Electronics and Nanotechnology Georgia Institute of Technology