Nanolithography.  The Electron Beam Lithography Facility at the Institute for Electronics and Nanotechnology of the Georgia Institute of Technology.Georgia Institute of TechnologyInstitute for Electronics and Nanotechnology
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IEN Webcams:

    The following links are to 4 different cameras in the EBL area.

    EBL column: This is the room housing the main electron column, high voltage source, and chamber.

    EBL cassette table: This table is also in the column room and it is where samples are carefully placed into cassettes on a teflon sheet.

    EBL spincoat area: Here samples are prepared for resist spin coating and baking. This room is adjacent to the console room.

    EBL console room: The main workstation is in this room. Job files are prepared and executed here.

Electron Beam Lithography Facility
Institute for Electronics and Nanotechnology, Georgia Institute of Technology