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Ellipsometry can be used to obtain index of refraction, absorption, and thickness of a thin film.
substrate = silicon piece
coat maN-2403, 4000 RPM, 2000 RPM/s, 60 sec
hot plate bake, 90 C, 1 min
coated 2/1/11
thickness = 291.417 nm +/- 0.03
MSE = 3.496
Cauchy
A = 1.5839
B = 0.014289
C = -5.1175e-005
nm n
400 1.67120723
405 1.66911265
410 1.66709196
415 1.66514175
420 1.6632588
425 1.66144009
430 1.65968274
435 1.65798405
440 1.65634146
445 1.65475253
450 1.65321498
455 1.65172663
460 1.65028541
465 1.64888936
470 1.64753664
475 1.64622548
480 1.64495419
485 1.6437212
490 1.64252499
495 1.64136411
500 1.6402372
505 1.63914295
510 1.63808012
515 1.63704752
520 1.63604402
525 1.63506855
530 1.63412007
535 1.63319761
540 1.63230022
545 1.631427
550 1.63057711
555 1.62974972
560 1.62894405
565 1.62815935
570 1.62739489
575 1.62665
580 1.625924
585 1.62521628
590 1.62452622
595 1.62385325
600 1.6231968
605 1.62255634
610 1.62193136
615 1.62132137
620 1.62072589
625 1.62014446
630 1.61957665
635 1.61902204
640 1.61848023
645 1.61795082
650 1.61743343
655 1.61692772
660 1.61643333
665 1.61594993
670 1.61547719
675 1.6150148
680 1.61456247
685 1.61411991
690 1.61368683
695 1.61326298
700 1.61284808
705 1.6124419
710 1.61204418
715 1.6116547
720 1.61127323
725 1.61089955
730 1.61053346
735 1.61017474
740 1.6098232
745 1.60947866
750 1.60914093
755 1.60880983
760 1.60848518
765 1.60816683
770 1.60785461
775 1.60754836
780 1.60724794
785 1.60695319
790 1.60666398
795 1.60638017
800 1.60610162
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