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ELECTRON RESISTS PROXIMITY EFFECT CORRECTION ANTI CHARGING ETCHING EVAPORATION/LIFTOFF AFM IMAGING SEM IMAGING CONTACT PROFILOMETRY REFLECTOMETRY ELLIPSOMETRY NANOIMPRINT TEMPLATES

Ellipsometry can be used to obtain index of refraction, absorption, and thickness of a thin film. index of refraction for PMMA index of refraction for ZEP520A index of refraction for maN-2403

Electron Beam Lithography Facility Institute for Electronics and Nanotechnology Georgia Institute of Technology