Nanolithography. The Electron Beam Lithography Facility at the Institute for Electronics and Nanotechnology of the Georgia Institute of Technology.
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ELECTRON RESISTS
PROXIMITY EFFECT CORRECTION
ANTI CHARGING
ETCHING
EVAPORATION/LIFTOFF
AFM IMAGING
SEM IMAGING
CONTACT PROFILOMETRY
REFLECTOMETRY
ELLIPSOMETRY
NANOIMPRINT TEMPLATES

PMMA (2,4,7%) thickness vs. spin speed curves



PMMA (6%) thickness vs. spin speed cuve




Electron Beam Lithography Facility
Institute for Electronics and Nanotechnology
Georgia Institute of Technology