Nanolithography.  The Electron Beam Lithography Facility at the Institute for Electronics and Nanotechnology of the Georgia Institute of Technology.Georgia Institute of TechnologyInstitute for Electronics and Nanotechnology
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    Contact profilometry uses a stylus to measure thin film thicknesses. The stylus comes into physical contact with the sample. For measuring resist thicknesses, it is good to use a stylus force of 2mg or less, as higher forces can penetrate the "soft" resist.

    Contact profilometry can only be used if the resist is patterned and does not measure resist thickness very well below ~150A. If the resist is unpatterned or is thinner than 150A, an ellipsometer or reflectometer should be used instead.

Electron Beam Lithography Facility
Institute for Electronics and Nanotechnology, Georgia Institute of Technology