Positive Electron Beam Resists:
950 PMMA A2, A4, A7, A11
MMA (8.5) MAA EL 6, EL 9
Negative Electron Beam Resists:
XR-1541 (HSQ, hydrogen silsequioxane)
Resist Proximity Effect Characterization Pattern:
This Excel file can help you characterize the right dose you need to use for a given line width and spacing in your resist and substrate process.
These two files, (file 1) and (file 2), are AutoCAD
files you can use, if you would like to modify them for your own purposes.