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Silicon Nanoimprint Template Shown in the above image is a 4" diameter crystalline silicon wafer with an array of 200 nm diameter holes on 300 nm pitch, etched to a depth of 500 nm and covering a 1.8 x 1.8 cm square area. We can fabricate nanoimprint templates to your specification. Please contact us for more information. Devin K. Brown, Senior Research Engineer Phone: (404) 385-4220 Email: devin.brown(at)mirc.gatech.edu |
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| Electron Beam Lithography Facility |
| Nanotechnology Research Center, Georgia Institute of Technology |